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| Full Title | Run-to-Run Control in Semiconductor Manufacturing 1st Edition |
|---|---|
| Author(s) | James Moyne |
| Edition | 1st Edition |
| ISBN | 9781351836128, 9780849311789, 9781315220239, 9781420040661, 9781351827430 |
| Publisher | CRC Press |
| Format | PDF and EPUB |
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine “runs,” thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry’s widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
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