Physics of Thin Films Advances in Research and Development
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Physics of Thin Films Advances in Research and Development

SKU: 9781483103310

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Full Title

Physics of Thin Films Advances in Research and Development
Author(s)
Edition
ISBN

9781483103310, 9780125330077
Publisher

Academic Press
Format

PDF and EPUB

Description

Physics of Thin Films: Advances in Research and Development, Volume 7 is a collection of papers about film growth and structure, optical properties, and semiconducting films. The book covers topics such as diffraction theory; film support and filter fabrication; aging, usage, and cleaning of filters; and properties and applications of III-V compound films. It also discusses topics such as the preparation of use and unbacked metal filters; electromigration in thin films; and the built-up molecular films and their applications. The text is recommended for physicists and engineers involved in thin film physics, especially those who would like to know more about the progresses in the field.

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Physics of Thin Films Advances in Research and Development
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Physics of Thin Films Advances in Research and Development

SKU: 9781483103303

Original price was: $72.95.Current price is: $24.99.

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Full Title

Physics of Thin Films Advances in Research and Development
Author(s)
Edition
ISBN

9781483103303, 9780125330138
Publisher

Academic Press
Format

PDF and EPUB

Description

Physics of Thin Films: Advances in Research and Development primarily deals with the influence of ions or optical energy on the deposition, properties, and etching on thin films. The book is a collection of five articles, with one article per chapter. Chapter 1 covers ionized cluster beam deposition; epitaxy; and film-formation mechanism. Chapter 2 discusses the activated reactive evaporation process; the deposition of refractory compounds; the role of plasma in the process; and its applications. Chapter 3 focuses on ion-beam processing of optical thin films; ion sources and ion-surface interactions; and the different kinds of bombardment involved. Chapter 4 deals with laser induced etching – its mechanisms, methods, and applications. Chapter 5 talks about contacts to GaAs devices; Fermi-level pinning; and heterojunction contacts. The book is recommended for physicists and engineers in the field of electronics who would like to know more about thin films and the progresses in the field.

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Physics of Thin Films Advances in Research and Development
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Physics of Thin Films Advances in Research and Development

SKU: 9781483144931

Original price was: $72.95.Current price is: $24.99.

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Full Title

Physics of Thin Films Advances in Research and Development
Author(s)
Edition
ISBN

9781483144931, 9780125330060
Publisher

Academic Press
Format

PDF and EPUB

Description

Physics of Thin Films: Advances in Research and Development, Volume 6 reviews the rapid progress that has been made in research and development concerning the physics of thin films, with emphasis on metallic films. Topics covered include anodic oxide films, thin metal films and wires, and multilayer magnetic films. This volume is comprised of five chapters and begins with a discussion on the dielectric properties and the technique of plasma anodization which are relevant to the applications of anodic oxide films in electronic devices. Conduction, polarization, and dielectric breakdown effects are also considered. The next chapter examines studies on size-dependent electrical conduction in thin metal films and wires, paying particular attention to both classical and quantum size effects and some of the anisotropic characteristics of epitaxial metal films. The reader is then introduced to the optical properties of metal films and interactions in multilayer magnetic films. This text concludes with a chapter that looks at diffusion in metallic films and presents experimental results for phase-forming systems, miscible systems, and lateral diffusion. This monograph will be of value to students and practitioners of physics, especially those interested in thin films.

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Physics of Thin Films Advances in Research and Development
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Physics of Thin Films Advances in Research and Development

SKU: 9781483144993

Original price was: $72.95.Current price is: $24.99.

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Full Title

Physics of Thin Films Advances in Research and Development
Author(s)
Edition
ISBN

9781483144993, 9780125330121
Publisher

Academic Press
Format

PDF and EPUB

Description

Physics of Thin Films: Advances in Research and Development, Volume 12 reviews advances that have been made in research and development concerning the physics of thin films. This volume covers a wide range of preparative approaches, physics phenomena, and applications related to thin films. This book is comprised of four chapters and begins with a discussion on metal coatings and protective layers for front surface mirrors used at various angles of incidence from the ultraviolet to the far infrared. Thin-film materials and deposition conditions suitable for minimizing reflectance changes with angle of incidence are described, along with novel oxide protective coatings with enhanced chemical stability and mechanical durability. The next chapter offers a comprehensive treatment of photoemissive materials. After giving a rather detailed review of the physics of photoemission, the main classes of thin-film photoemitters, including Ag-O-Cs, alkali antimonides, and negative-electron affinity photocathodes, are considered. A description of field-assisted cathodes potentially suitable for wavelengths beyond 1.1 micrometers, such as transferred-electron structures and field-emission arrays, is also given. The reader is then introduced to spray pyrolysis and the solution growth technique for chemical solution deposition of inorganic films. This text concludes with a chapter on plasma-enhanced chemical vapor deposition of thin films, paying particular attention to the experimental conditions required for a range of element and compound materials as well as some of the unusual film properties and structures achieved by this approach. This monograph will be useful to students and practitioners of physics, especially those interested in thin films.

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