High Density Plasma Sources: Design, Physics and Performance
-88%
Availability: In Stock

High Density Plasma Sources: Design, Physics and Performance

SKU: 9780815513773

Original price was: $200.00.Current price is: $24.99.

Access High Density Plasma Sources: Design, Physics and Performance Now. Discount up to 90%

Categories: ,

Additional information

Full Title

High Density Plasma Sources: Design, Physics and Performance
Author(s)

Popov, Oleg A.
Edition
ISBN

9780815513773, 9780815517894
Publisher

William Andrew Publishing
Format

PDF and EPUB

Description

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications.

This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

Related products